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Product List (Total 10 Products)

1. High-Purity Chromium (Cr) Sputtering Target

Product DeScription: Material: High-purity chromium (Cr) sputtering target (1) Shape: Planar target Purity: 99.5%--99.95% Max. Size: 600mm x 200mm (2) Shape: Cylindrical ...
Last Updated: 2009-09-07

2. Rotating Aluminum (Al) Target

Material: Rotating aluminum (Al) target Purity: 3N Shape: Planar target / rotating target Max. Size: Diameter 60/65/95/100x30/32/40/45mm
Last Updated: 2009-07-28

3. Copper Indium Gallium Di-Selenide (CIGS)

The information of Copper Indium Gallium di-Selenide (CIGS) in our company is as follows: Our company can produce High-purity Copper Indium Gallium di-Selenide (CIGS) for more ...
Last Updated: 2009-07-28

4. High-Purity Selenium Sputtering Target

Product Description: High-purity selenium sputtering target Purity: 3~5N Max. Size: 1000x300mm
Last Updated: 2009-06-12

5. Titanium Aluminum (TiAl) Alloy Sputtering Target

Product Description: Material: Titanium aluminum (TiAl) alloy sputtering target Purity: 2N5 Max. Size: 200~400x200mm
Last Updated: 2009-06-12

6. Graphite Sputtering Target

Product Description: Material: Graphite sputtering target Purity: 3~5N Max. Size: 500x300mm
Last Updated: 2009-06-12

7. Copper Indium Gallium Alloy Sputtering Target

Product Description: Material: Copper indium gallium alloy sputtering target Purity: 3N~4N Max. Size: 1000x300mm
Last Updated: 2009-06-12

8. Copper Gallium (CuGa) Alloy Sputtering Target

Material: Copper gallium (CuGa) alloy sputtering target(Cu/Ga 85: 15 at%) Purity: 3N~4N Max. Size: 1000x300mm
Last Updated: 2009-06-12

9. High Aluminum (Al) Sputtering Target

Material: High aluminum (Al) sputtering target Purity: 3~5N Max. Size: 1000x300mm
Last Updated: 2009-06-12

10. Tungsten Sputtering Target

Product Description Composition (wt%) Ca <0.005 Al <0.005 Fe <0.008 Mg <0.005 Mo <0.008 Si <0.005 P <0.007 N <0.002 O <0.003 Physical Properties Relative Density ...
Last Updated: 2009-02-17